Real-time measurement and correction of the emissivity of the target wafer during the semiconductor process enables accurate temperature measurement regardless of the type of wafer film!
Monitoring the wafer temperature during the semiconductor process is a very important process parameter; however, due to the lack of an established appropriate measurement method, we have been inferring the process conditions based on parameters other than temperature.
Despite the variation in emissivity within a lot, general radiation thermometers require the user to arbitrarily determine the emissivity of the object being measured, leading to temperature errors and a lack of reliability in the temperature measurement itself.
Our real-time emissivity-corrected semiconductor process temperature monitor can measure and correct the emissivity of the target wafer in real time, enabling accurate temperature measurement regardless of the type of wafer film.
Additionally, thanks to our unique high-sensitivity infrared measurement technology, measurements can be taken down to low temperatures (close to the sensitivity limit of the detector). We can also provide various solutions for the stray light issues that have been problematic in the chamber.
